Vijay Commercial House

We have a wide range of products, including wafer & substrate and sputter target materials , product's main application is for Semiconductor, Microelectronics , Opto-electronics , Nanotechnology , MEMS and Biotechnology 
Silicon WaferThermal Oxide WaferSOI WaferLPCVD Si3N4 WaferIntrinsic WaferGe Wafer
GaAs WaferGaP WaferGaSb WaferInAs WaferInP WaferInSb Wafer
ZnO WaferSapphire WaferSiC WaferZnS WaferCdS WaferCdSe WaferGaAs Epitaxial WaferAlGaAs Epitaxial WaferLT-GaAs Epitaxial WaferInP Epitaxial WaferInGaAs Epitaxial WaferGaN Epitaxial WaferSrTiO3 WaferMgO WaferLaAlO3 WaferNaCl WaferTiO2 WaferLSAT WaferQuartz WaferFused Silica WaferSingle Crystal Quartz WaferGlass WaferBorofloat WaferSoda Lime Wafer

We offer various Sputtering target with Copper backing plate for PVD,Multi ARC & Magnetron Coating machines
We provide one of the largest, most comprehensive lines of sputtering target materials. All popular geometries (and sizes) including rings, S-Guns and circular, rectangular and triangular and planar targets are available. Most sputtering target materials can be fabricated into a wide range of shapes and sizes. There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or bevelled joints.
Pure MetalsOxidesCompounds/ Alloys,Borides,Carbides,Fluorides,Nitrides,Selenides,Silicides,Sulphides,Tellurides,Target Bonding

 pyrolytic graphite crucibles (PG crucibles). In pyrolytic graphite crucibles (about 2000°C) under reduced pressure in an inert atmosphere, hydrocarbons are decomposed and polymerized to produce huge aromatic hydrocarbons, which are then deposited on the surface of high-purity graphite matrix materials, which are made by dehydrogenation and recrystallization.

We offer Sputtering target on backing plate for PVD,ARC & Magnatron Machines.
We provide one of the largest, most comprehensive lines of sputtering target materials. All popular geometries (and sizes) including rings, S-Guns and circular, rectangular and triangular and planar targets are available. Most sputtering target materials can be fabricated into a wide range of shapes and sizes. There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or bevelled joints.
Pure MetalsOxidesCompounds/ AlloysBoridesCarbidesFluoridesNitridesSelenidesSilicidesSulphidesTelluridesTarget Bonding
ceramic, metal, alloy targets and various other special material targets. After several years of technology accumulation, it has core technologies such as plasma spraying, ceramic sintering, and vacuum melting. The company provides a complete set of equipment and technology for sputtering targets, plasma spraying and casting rotating targets, and also undertakes processing services such as arc and ion spraying surface treatment.Application:PVD Multi ARC & Magnetron Coating machines

We offer Tungsten Crucibles & Boats:
Properties

1. Purity :W≥99.95

2. Density 18.5g/cm3

3. Maximum ambient temperature 2400

 

Forging tungsten crucible

Sintered tungsten crucible

We offer Evaporation Materials
Our evaporation materials represent the finest coating materials available today which have been processed or especially developed to meet demanding requirements of scientific experimentation, product and process development or full scale production. All evaporation materials are supplied with the appropriate Material Safety Data Sheets (MSDS), RoHS-Certificates and Certificate of Analysis (COA), relevant to the lot number supplied. Our product range comprises more than 60 evaporation materials including special mixtures and substances, as well as fluorides, oxides, sulphides and metals available as granules tablets, or disks.
Pure MetalsOxidesMixturesBorides/ CarbidesFluoridesTelluridesNitridesSulphides/ Selenides